Onto Innovation Receives Volume Purchase Agreement from a Leading DRAM Manufacturer for Metrology Product Suite
Onto Innovation (NYSE: ONTO) has secured a significant $69 million volume purchase agreement with a leading DRAM manufacturer for its optical metrology ecosystem. The agreement covers common films, optical critical dimension, and integrated metrology solutions, with deliveries starting in Q1 2025.
The company has also announced the launch of its new Iris G2 system, a single platform film metrology system designed for both common and critical films applications. The system features deep ultraviolet spectroscopic ellipsometry for common films and proprietary laser ellipsometry technologies for critical films. This innovation targets the critical films market, estimated to reach $400 million in 2025.
The company reports that demand for its films metrology has nearly doubled year over year. The Iris G2 system aims to provide improved stability and higher throughput for ultra-thin multilayer films measuring 10Å to 50Å, while offering customers flexibility in optimizing cost of ownership and performance.
Onto Innovation (NYSE: ONTO) ha ottenuto un importante accordo di acquisto volumetrico di 69 milioni di dollari con un principale produttore di DRAM per il suo ecosistema di metrologia ottica. L'accordo comprende film comuni, dimensioni critiche ottiche e soluzioni di metrologia integrata, con consegne che inizieranno nel primo trimestre del 2025.
L'azienda ha anche annunciato il lancio del nuovo sistema Iris G2, un sistema di metrologia per film su piattaforma singola progettato per applicazioni di film comuni e critici. Il sistema dispone di ellipsometria spettroscopica nell'ultravioletto profondo per film comuni e tecnologie di ellipsometria laser proprietarie per film critici. Questa innovazione punta al mercato dei film critici, stimato raggiungere 400 milioni di dollari nel 2025.
L'azienda riporta che la domanda per la sua metrologia dei film è quasi raddoppiata rispetto all'anno precedente. Il sistema Iris G2 mira a fornire una maggiore stabilità e una maggiore produttività per film multilayer ultra-sottili che misurano da 10Å a 50Å, offrendo agli utenti flessibilità nell'ottimizzazione del costo di proprietà e delle prestazioni.
Onto Innovation (NYSE: ONTO) ha conseguido un importante acuerdo de compra por volumen de 69 millones de dólares con un destacado fabricante de DRAM para su ecosistema de metrología óptica. El acuerdo abarca películas comunes, dimensiones críticas ópticas y soluciones de metrología integrada, con entregas comenzando en el primer trimestre de 2025.
La compañía también ha anunciado el lanzamiento de su nuevo sistema Iris G2, un sistema de metrología de película en una sola plataforma diseñado para aplicaciones de películas comunes y críticas. El sistema presenta espectroscopía de ellipsometría ultravioleta profunda para películas comunes y tecnologías de ellipsometría láser propietarias para películas críticas. Esta innovación apunta al mercado de películas críticas, que se estima alcanzará 400 millones de dólares en 2025.
La compañía informa que la demanda de su metrología de películas casi se ha duplicado año tras año. El sistema Iris G2 tiene como objetivo proporcionar mayor estabilidad y mayor rendimiento para películas multicapa ultra delgadas que miden de 10Å a 50Å, ofreciendo a los clientes flexibilidad para optimizar el costo de propiedad y el rendimiento.
Onto Innovation (NYSE: ONTO)는 주요 DRAM 제조업체와 6900만 달러 규모의 구매 계약을 체결하여 광학 계측 생태계를 구축했습니다. 이 계약은 일반 필름, 광학 중요 치수 및 통합 계측 솔루션을 포함하며, 배송은 2025년 1분기부터 시작됩니다.
회사는 또한 Iris G2 시스템의 출시를 발표했으며, 이는 일반 및 중요한 필름 애플리케이션을 위해 설계된 단일 플랫폼 필름 계측 시스템입니다. 이 시스템은 일반 필름에 대해 깊은 자외선 분광 엘립소메트리를, 중요한 필름에 대해 독점적인 레이저 엘립소메트리 기술을 특징으로 합니다. 이 혁신은 2025년까지 4억 달러에 이를 것으로 예상되는 중요 필름 시장을 겨냥하고 있습니다.
회사는 필름 계측에 대한 수요가 전년 대비 거의 두 배 증가했다고 보고했습니다. Iris G2 시스템은 10Å에서 50Å까지 측정하는 초 얇은 다층 필름에 대한 안정성을 높이고 처리량을 향상시키는 것을 목표로 하며, 고객에게 소유 비용 및 성능 최적화의 유연성을 제공합니다.
Onto Innovation (NYSE: ONTO) a sécurisé un important contrat d'achat de volume de 69 millions de dollars avec un fabricant de DRAM de premier plan pour son écosystème de métrologie optique. Le contrat couvre les films courants, les dimensions critiques optiques et les solutions de métrologie intégrée, avec des livraisons prévues à partir du premier trimestre 2025.
L'entreprise a également annoncé le lancement de son système Iris G2, un système de métrologie de film sur une plateforme unique conçu pour des applications de films courants et critiques. Le système dispose d'une ellipsométrie spectroscopique ultraviolette profonde pour les films courants et de technologies d'ellipsométrie laser propriétaires pour les films critiques. Cette innovation cible le marché des films critiques, estimé à atteindre 400 millions de dollars en 2025.
L'entreprise signale que la demande pour sa métrologie de films a presque doublé d'une année sur l'autre. Le système Iris G2 vise à fournir une stabilité améliorée et un meilleur rendement pour les films multicouches ultra-fins mesurant de 10 Å à 50 Å, tout en offrant aux clients une flexibilité dans l'optimisation des coûts de possession et des performances.
Onto Innovation (NYSE: ONTO) hat einen bedeutenden Volumen-Kaufvertrag über 69 Millionen Dollar mit einem führenden DRAM-Hersteller für sein optisches Metrologie-Ökosystem gesichert. Der Vertrag umfasst allgemeine Filme, optische kritische Dimensionen und integrierte Metrologielösungen, wobei die Lieferungen im ersten Quartal 2025 beginnen.
Das Unternehmen hat auch die Einführung seines neuen Iris G2-Systems angekündigt, einem Metologiesystem für Filme auf einer Plattform, das sowohl für gewöhnliche als auch für kritische Filme ausgelegt ist. Das System bietet tiefen UV-spektroskopische Ellipsometrie für allgemeine Filme und proprietäre Laserellipsometrie-Technologien für kritische Filme. Diese Innovation zielt auf den Markt für kritische Filme ab, der voraussichtlich im Jahr 2025 400 Millionen Dollar erreichen wird.
Das Unternehmen berichtet, dass die Nachfrage nach seiner Filmmetrologie im Jahresvergleich fast doppelt so hoch ist. Das Iris G2-System zielt darauf ab, die Stabilität zu verbessern und eine höhere Durchsatzrate für ultra-dünne Multilayer-Filme von 10 Å bis 50 Å zu bieten und den Kunden Flexibilität bei der Optimierung von Eigentumskosten und Leistung zu bieten.
- Secured $69 million volume purchase agreement with major DRAM manufacturer
- Films metrology revenue nearly doubled year over year
- Entering $400 million critical films market with new Iris G2 system
- First deliveries aligned with expected DRAM market recovery in 2025
- None.
Insights
The
The doubling of films metrology revenue year-over-year indicates robust demand beyond memory applications, suggesting diversified revenue streams. The Iris G2 system's dual capability for common and critical films could drive higher margins through operational efficiency and reduced capital requirements for customers. This positions Onto to capture a larger share of the specialty semiconductor market while maintaining strong presence in advanced nodes.
The technical specifications of the Iris G2 system are particularly impressive, combining deep ultraviolet spectroscopic ellipsometry with proprietary laser ellipsometry for critical films measurement. The ability to measure ultra-thin multilayer films between 10Å to 50Å is important for advanced semiconductor manufacturing processes, especially in memory and logic applications. The single-platform approach for both common and critical films measurement represents a significant technological advancement, potentially reducing integration complexities and improving overall measurement accuracy.
For non-technical readers: Think of this like having a super-precise microscope that can measure layers thousands of times thinner than a human hair, all while being faster and more reliable than previous technology. This precision is essential for making modern electronic devices work properly.
The timing of this agreement is strategically significant, coinciding with the anticipated DRAM market recovery in 2025. The semiconductor industry's shift toward more sophisticated manufacturing processes has created increased demand for advanced metrology solutions. Onto's market expansion into the
The volume purchase agreement from a leading DRAM manufacturer serves as a strong validation of Onto's technology and could influence other major players in the memory market to follow suit. This could create a domino effect, potentially leading to additional contracts throughout 2025 as the memory market recovery gains momentum.
Announces expansion of metrology suite to support the estimated
Beyond memory, the demand for Onto Innovation’s films metrology has been robust, nearly doubling in revenue year over year. In response to market feedback, Onto Innovation is pleased to announce the launch of the Iris G2 system, a single platform film metrology system for both common and critical films for advanced node, mature and specialty device applications.
The Iris G2 system features deep ultraviolet (DUV) spectroscopic ellipsometry (SE) for common films and coupled proprietary laser ellipsometry technologies for critical films. This single platform is expected to serve all common and critical films applications, providing customers with the flexibility to optimize cost of ownership and performance based on their needs. Additionally, a single platform simplifies fleet management and fab operations while reducing overall capital investment.
“The Iris G2 system offers a flexible, compelling cost of ownership metrology solution for ultra-thin multilayer films measuring 10Å to 50Å,” says Zhuan Liu, vice president of Onto’s optical metrology suite. “We believe our proprietary technology will achieve better stability and higher throughput compared to alternative technologies.”
The Iris G2 system will address the critical films market, forecast to be approximately
About Onto Innovation Inc.
Onto Innovation is a leader in process control, combining global scale with an expanded portfolio of leading-edge technologies that includes un-patterned wafer quality, 3D metrology spanning chip features from nanometer scale transistors to large die interconnects, macro defect inspection of wafers and packages, metal interconnect composition, factory analytics, and lithography for advanced semiconductor packaging.
Our breadth of offerings across the entire semiconductor value chain combined with our connected thinking approach results in a unique perspective to help solve our customers’ most difficult yield, device performance, quality, and reliability issues. Onto Innovation strives to optimize customers’ critical path of progress by making them smarter, faster and more efficient. With headquarters and manufacturing in the
Forward Looking Statements
This press release contains forward-looking statements within the meaning of the Private Securities Litigation Reform Act of 1995 (the “Act”) which include statements relating to Onto Innovation’s business momentum and future growth; the benefit to customers and the capabilities of Onto Innovation’s products and customer service; Onto Innovation’s ability to both deliver products and services consistent with our customers’ demands and expectations and strengthen its market position, Onto Innovation’s beliefs about market opportunities as well as other matters that are not purely historical data. Onto Innovation wishes to take advantage of the “safe harbor” provided for by the Act and cautions that actual results may differ materially from those projected as a result of various factors, including risks and uncertainties, many of which are beyond Onto Innovation’s control. Such factors include, but are not limited to, the Company’s ability to leverage its resources to improve its position in its core markets; its ability to weather difficult economic environments; its ability to open new market opportunities and target high-margin markets; the strength/weakness of the back-end and/or front-end semiconductor market segments; fluctuations in customer capital spending and any potential impact as a result of the novel coronavirus situation; the Company’s ability to effectively manage its supply chain and adequately source components from suppliers to meet customer demand; its ability to adequately protect its intellectual property rights and maintain data security; its ability to effectively maneuver global trade issues and changes in trade and export license policies; the Company’s ability to maintain relationships with its customers and manage appropriate levels of inventory to meet customer demands; and the Company’s ability to successfully integrate acquired businesses and technologies. Additional information and considerations regarding the risks faced by Onto Innovation are available in Onto Innovation’s Form 10-K report for the year ended December 30, 2023, and other filings with the Securities and Exchange Commission. As the forward-looking statements are based on Onto Innovation’s current expectations, the Company cannot guarantee any related future results, levels of activity, performance or achievements. Onto Innovation does not assume any obligation to update the forward-looking information contained in this press release, except as required by law.
Source: Onto Innovation Inc.
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Investor Relations:
Sidney Ho, +1 408.376.9163
sidney.ho@ontoinnovation.com
Source: Onto Innovation Inc.
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