Nova Metrion® Selected by a Leading Memory Manufacturer
Nova (Nasdaq: NVMI) announced the selection of its Nova Metrion® platform by a leading memory manufacturer for advanced DRAM R&D and high-volume manufacturing of DRAM and NAND. The platform was chosen for its ability to perform full-wafer measurements of epitaxial layers with high sensitivity and precision.
The Nova Metrion® enables inline SIMS measurements of materials composition depth profiles, providing tighter process control and improved yield in next-generation devices. The technology offers unique in-line composition profiling for key process control measurements, including dopant concentration, contamination, residues, and diffusion. Nova expects additional orders as the manufacturer expands its inline metrology capabilities.
Nova (Nasdaq: NVMI) ha annunciato la selezione della sua piattaforma Nova Metrion® da parte di un importante produttore di memorie per la ricerca e sviluppo avanzata della DRAM e la produzione ad alta volume di DRAM e NAND. La piattaforma è stata scelta per la sua capacità di eseguire misurazioni su wafer completi delle strati epitassiali con alta sensibilità e precisione.
Il Nova Metrion® consente misurazioni SIMS in linea dei profili di profondità della composizione dei materiali, fornendo un controllo del processo più rigoroso e un miglioramento del rendimento nei dispositivi di prossima generazione. La tecnologia offre profili di composizione in-line unici per misurazioni chiave del controllo del processo, inclusi la concentrazione di droganti, contaminazione, residui e diffusione. Nova prevede ulteriori ordini mentre il produttore espande le sue capacità di metrologia in linea.
Nova (Nasdaq: NVMI) anunció la selección de su plataforma Nova Metrion® por un importante fabricante de memoria para I+D avanzada de DRAM y producción a gran escala de DRAM y NAND. La plataforma fue elegida por su capacidad para realizar mediciones de obleas completas de capas epitaxiales con alta sensibilidad y precisión.
El Nova Metrion® permite mediciones SIMS en línea de los perfiles de profundidad de composición de materiales, proporcionando un control de proceso más riguroso y un rendimiento mejorado en dispositivos de próxima generación. La tecnología ofrece un perfilado de composición en línea único para mediciones clave de control de procesos, incluyendo concentración de dopantes, contaminación, residuos y difusión. Nova espera recibir pedidos adicionales a medida que el fabricante expande sus capacidades de metrología en línea.
노바 (Nasdaq: NVMI)는 주요 메모리 제조업체가 고급 DRAM 연구 및 개발 및 대량 생산 위해 노바 메트리온® 플랫폼을 선택했다고 발표했습니다. 이 플랫폼은 고감도와 정밀도로 에피탁시얼 층의 전 웨이퍼 측정을 수행할 수 있는 능력으로 선택되었습니다.
노바 메트리온®은 소재의 깊이 프로파일의 조성 측정을 위한 인라인 SIMS 측정을 가능하게 하여 차세대 장치에서 더 엄격한 프로세스 제어와 향상된 수율을 제공합니다. 이 기술은 도판트 농도, 오염, 잔여물, 확산 등 주요 프로세스 제어 측정을 위한 독특한 인라인 조성 프로파일링을 제공합니다. 노바는 제조업체가 인라인 메트롤 로지 능력을 확장함에 따라 추가 주문을 예상하고 있습니다.
Nova (Nasdaq: NVMI) a annoncé la sélection de sa plateforme Nova Metrion® par un fabricant de mémoire leader pour la recherche et développement avancée de DRAM et la production de DRAM et NAND en grande quantité. La plateforme a été choisie en raison de sa capacité à effectuer des mesures sur wafers complets de couches épitaxiales avec une grande sensibilité et précision.
Le Nova Metrion® permet des mesures SIMS en ligne des profils de profondeur de composition des matériaux, offrant un meilleur contrôle des processus et un rendement amélioré dans les dispositifs de nouvelle génération. La technologie offre un profilage de composition en ligne unique pour des mesures clés de contrôle des processus, y compris la concentration des dopants, la contamination, les résidus et la diffusion. Nova s'attend à recevoir des commandes supplémentaires à mesure que le fabricant étend ses capacités de métrologie en ligne.
Nova (Nasdaq: NVMI) gab die Auswahl seiner Nova Metrion® Plattform durch einen führenden Speicherhersteller für fortschrittliche DRAM F&E und die Hochvolumenproduktion von DRAM und NAND bekannt. Die Plattform wurde wegen ihrer Fähigkeit ausgewählt, vollständige Wafermessungen von epitaxialen Schichten mit hoher Empfindlichkeit und Präzision durchzuführen.
Die Nova Metrion® ermöglicht Inline-SIMS-Messungen von Materialzusammensetzungs-Tiefenprofilen, was eine genauere Prozesskontrolle und eine verbesserte Ausbeute bei Geräten der nächsten Generation bietet. Die Technologie bietet einzigartige In-line-Zusammensetzungsprofile für wichtige Prozesskontrollmessungen, einschließlich Dotierstoffkonzentration, Kontamination, Rückstände und Diffusion. Nova erwartet zusätzliche Aufträge, während der Hersteller seine Inline-Metrologiefähigkeiten erweitert.
- Selection by major memory manufacturer for DRAM R&D and high-volume manufacturing
- Expected additional orders from the same customer
- Unique technological advantage in inline composition profiling capability
- None.
Insights
The selection of Nova's Metrion® platform by a major memory manufacturer represents a significant technological breakthrough in semiconductor metrology. The platform's ability to perform inline SIMS measurements in a high-volume manufacturing environment is revolutionary, as such measurements were traditionally to lab settings. This capability directly addresses the critical challenge of process control in advanced memory fabrication.
The strategic importance lies in the platform's unique ability to measure epitaxial layers and complex multilayer films with high precision - essential for both DRAM and NAND manufacturing. This technology enables real-time monitoring of dopant concentrations and contamination levels, which are important for maintaining yield rates in memory chip production. The fact that a leading memory manufacturer has chosen this solution for both R&D and production lines indicates strong market validation.
This deal positions Nova advantageously in the growing market for advanced process control tools, particularly as the semiconductor industry moves toward more complex 3D structures and new materials. The mention of expected additional orders suggests this could be the beginning of a larger deployment across the customer's manufacturing facilities.
This customer win carries substantial market implications for Nova. The memory chip market is highly concentrated among a few major players, making each customer relationship strategically valuable. The dual implementation in both R&D and production environments suggests a long-term commitment from the customer, potentially leading to recurring revenue streams as the manufacturer expands its operations.
The timing is particularly favorable as memory manufacturers are investing heavily in new manufacturing capabilities amid growing demand for advanced memory solutions. The prospect of additional orders indicates potential revenue growth beyond the initial deployment. For context, metrology equipment typically represents
REHOVOT,
Nova Metrion® provides tighter process control and improves yield by allowing inline SIMS (secondary ion mass spectrometry) measurements of materials composition depth profiles in next-generation devices. The platform selection was based on its ability to perform full-wafer measurements of epitaxial layers, with high sensitivity and precision.
Nova Metrion® breakthrough technology enables advanced process control of complex and critical multilayer films. It is designed from the ground up for a high-volume manufacturing environment and provides quantitative and actionable results with high-depth resolution and precision. The Metrion® introduces a unique in-line composition profiling capability for key process control measurements, including dopant concentration, contamination, residues, and diffusion, which cannot be obtained by other measurement techniques.
"Bridging the chasm between lab and fab environments is becoming a critical factor in enabling next-generation device manufacturing," said Gaby Waisman, President and Chief Executive Officer of Nova. "Our ability to provide customers with unique solutions like the Nova Metrion®, addresses the increasing need for materials process control in advanced memory and logic devices."
About Nova
Nova is a leading innovator and key provider of material, optical and chemical metrology solutions for advanced process control in semiconductor manufacturing. Nova delivers continuous innovation by providing state-of-the-art, high-performance metrology solutions for effective process control throughout the semiconductor fabrication lifecycle. Nova's product portfolio, which combines high-precision hardware and cutting-edge software, provides its customers with deep insight into developing and producing the most advanced semiconductor devices. Nova's unique capability to deliver innovative solutions enables its customers to improve performance, enhance product yields, and accelerate time to market. Nova acts as a partner to semiconductor manufacturers from its offices worldwide. Additional information may be found on Nova's website link - https://www.novami.com/
Nova is traded on the Nasdaq and TASE, Nasdaq ticker symbol NVMI.
Forward-Looking Statements
This press release contains forward-looking statements within the meaning of safe harbor provisions of the Private Securities Litigation Reform Act of 1995 relating to future events or our future performance, such as statements regarding, but not limited to, anticipated growth opportunities and projections about our business and its future revenues, expenses and profitability. Forward-looking statements involve known and unknown risks, uncertainties and other factors that may cause our actual results, levels of activity, performance or achievements to differ materially from any future results, levels of activity, performance or achievements expressed or implied in those forward-looking statements. Factors that may affect our results, performance, circumstances or achievements include, but are not limited to, the following: increased information technology security threats and sophisticated computer crime; foreign political and economic risks including supply-chain difficulties; regulations that could restrict our operations such as economic sanctions and export restrictions; changes in
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SOURCE Nova
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