Nova Ltd. Expands Innovative Nova Fit® Machine Learning Capabilities to Enhance VeraFlex® Platform
Nova announced the expansion of its Nova Fit® machine learning solution to enhance the VeraFlex IV® platform for Materials Metrology. The new version, already deployed at a customer site for Gate-All-Around applications, aims to improve throughput and precision in high-volume semiconductor manufacturing. The solution offers machine learning modules that significantly reduce acquisition time while maintaining precision and yield. Nova Fit®'s scalable design allows for continuous deployment of new modules to address emerging challenges, combining accuracy with efficient solution implementation.
Nova ha annunciato l'espansione della sua soluzione di machine learning Nova Fit® per potenziare la piattaforma VeraFlex IV® dedicata alla Metrologia dei Materiali. La nuova versione, già implementata presso un cliente per applicazioni Gate-All-Around, mira a migliorare il throughput e la precisione nella produzione di semiconduttori ad alto volume. La soluzione offre moduli di machine learning che riducono significativamente il tempo di acquisizione mantenendo allo stesso tempo precisione e rendimento. Il design scalabile di Nova Fit® consente il costante deployment di nuovi moduli per affrontare le sfide emergenti, combinando accuratezza con un'implementazione efficiente delle soluzioni.
Nova anunció la expansión de su solución de aprendizaje automático Nova Fit® para mejorar la plataforma VeraFlex IV® en Metrología de Materiales. La nueva versión, ya implementada en el sitio de un cliente para aplicaciones Gate-All-Around, tiene como objetivo mejorar el rendimiento y la precisión en la fabricación de semiconductores de alto volumen. La solución ofrece módulos de aprendizaje automático que reducen significativamente el tiempo de adquisición mientras mantienen la precisión y el rendimiento. El diseño escalable de Nova Fit® permite el despliegue continuo de nuevos módulos para abordar los desafíos emergentes, combinando precisión con una implementación eficiente de soluciones.
노바는 자재 측정 플랫폼 베라플렉스 IV®를 향상시키기 위해 기계 학습 솔루션 노바 핏®의 확장을 발표했습니다. 새로운 버전은 이미 고객 사이트에서 게이트-올-어라운드 응용 프로그램에 배포되어 있으며, 대량 반도체 제조에서 처리량과 정밀도를 향상시키는 것을 목표로 하고 있습니다. 이 솔루션은 정밀도와 수율을 유지하면서 획득 시간을 크게 단축하는 기계 학습 모듈을 제공합니다. 노바 핏®의 확장 가능한 디자인은 새로운 모듈의 지속적인 배포를 가능하게 하여 emerging challenges를 해결하며, 정확성과 효율적인 솔루션 구현을 결합합니다.
Nova a annoncé l'extension de sa solution d'apprentissage automatique Nova Fit® pour améliorer la plateforme VeraFlex IV® dédiée à la métrologie des matériaux. La nouvelle version, déjà déployée chez un client pour des applications Gate-All-Around, vise à améliorer le débit et la précision dans la fabrication de semiconducteurs à haut volume. La solution propose des modules d'apprentissage automatique qui réduisent considérablement le temps d'acquisition tout en maintenant la précision et le rendement. Le design évolutif de Nova Fit® permet un déploiement continu de nouveaux modules pour faire face aux défis émergents, combinant précision et mise en œuvre efficace des solutions.
Nova hat die Erweiterung seiner Machine-Learning-Lösung Nova Fit® zur Verbesserung der Plattform VeraFlex IV® für die Materialmetrologie angekündigt. Die neue Version ist bereits an einem Kundenstandort für Gate-All-Around-Anwendungen implementiert und zielt darauf ab, den Durchsatz und die Präzision in der Hochvolumen-Halbleiterfertigung zu verbessern. Die Lösung bietet Machine-Learning-Module, die die Erfassungszeit erheblich reduzieren und gleichzeitig Präzision und Ausbeute beibehalten. Das skalierbare Design von Nova Fit® ermöglicht eine kontinuierliche Bereitstellung neuer Module, um auf aufkommende Herausforderungen zu reagieren und Genauigkeit mit einer effizienten Implementierung von Lösungen zu kombinieren.
- Successfully deployed new Nova Fit® solution at customer site for GAA applications
- Technology enables significant reduction in acquisition time while maintaining precision
- Scalable solution allows continuous deployment of new modules
- Strengthens market position in advanced materials metrology
- None.
Insights
The integration of Nova Fit® machine learning with the VeraFlex IV® platform marks a significant technological advancement in semiconductor metrology. The solution's successful deployment for Gate-All-Around applications is particularly noteworthy, as GAA represents the next generation of transistor architecture beyond FinFET technology.
The enhanced throughput capabilities while maintaining precision in high-volume manufacturing addresses a critical industry bottleneck. The scalable architecture allowing for continuous module deployment positions Nova strategically in the evolving semiconductor landscape, especially as chip manufacturers transition to more complex 3D structures and sub-3nm nodes.
The impact on Nova's competitive position should be positive, as this enhancement strengthens their materials metrology portfolio at a time when process control is becoming increasingly critical for semiconductor manufacturing yields.
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This new version supports customers' need for enhanced throughput and precision in high-volume manufacturing of advanced logic and memory semiconductor devices. The solution has already been successfully deployed at a customer's site, demonstrating its capability for Gate-All-Around (GAA) applications.
This new Materials Metrology centric Nova Fit®, a state-of-the-art machine learning hub, offers a versatile suite of machine learning productivity and yield enhancement modules for VeraFlex IV®. For example, Nova Fit® enables VeraFlex IV® customers to significantly shorten the acquisition time while maintaining high levels of precision and yield.
The scalable nature of Nova Fit® allows customers to continually deploy new modules over time, addressing emerging challenges, and combining robust accuracy with minimized time to solution, driving metrology performance, and expanding the metrology envelope for enhanced process control.
"This latest addition to our growing portfolio of advanced materials metrology and machine learning solutions further cements our position as a market leader and underscores our commitment to providing innovative solutions for our customers' challenges," said Adrian Wilson, President and General Manager, Materials Metrology Division at Nova. "We continue to deliver breakthrough innovations in process control, enabling our customers to increase yield, shorten time-to-market, and improve productivity while addressing emerging challenges in the most advanced technology nodes."
About Nova
Nova is a leading innovator and key provider of material, optical and chemical metrology solutions for advanced process control in semiconductor manufacturing. Nova delivers continuous innovation by providing state-of-the-art, high-performance metrology solutions for effective process control throughout the semiconductor fabrication lifecycle. Nova's product portfolio, which combines high-precision hardware and cutting-edge software, provides its customers with deep insight into developing and producing the most advanced semiconductor devices. Nova's unique capability to deliver innovative solutions enables its customers to improve performance, enhance product yields, and accelerate time to market. Nova acts as a partner to semiconductor manufacturers from its offices worldwide. Additional information may be found on Nova's website link - https://www.novami.com/
Nova is traded on the Nasdaq and TASE, Nasdaq ticker symbol NVMI.
Forward-Looking Statements
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SOURCE Nova
FAQ
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