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ACM Research Receives Purchase Order for SAPS Tool from Major European Global Semiconductor Manufacturer

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ACM Research, Inc. (ACMR) announced its first tool order for the Ultra C SAPS-V cleaning tool from a leading European semiconductor manufacturer, expected to ship in Q4 2023. This marks a significant step in ACM's expansion into the European market, following its success in China and ongoing evaluations in the U.S. Dr. David Wang emphasized the importance of this order as a testament to their technology’s strength and the sales team’s efforts. The SAPS technology offers superior cleaning through innovative megasonic wave application, enhancing efficiency and effectiveness in semiconductor manufacturing.

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  • First tool order in Europe indicates expanding market presence.
  • SAPS technology offers enhanced cleaning efficiency for semiconductor devices.
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FREMONT, Calif., Feb. 24, 2023 (GLOBE NEWSWIRE) -- ACM Research, Inc. (ACM) (NASDAQ: ACMR), a leading supplier of wafer processing solutions for semiconductor and advanced wafer-level packaging applications, today announced the receipt of a first tool order for its Ultra C SAPS-V cleaning tool from a major Europe-based global semiconductor manufacturer. The tool is expected to be shipped to the prospective customer’s European facility in the fourth quarter of 2023.

“We are pleased to make further progress on ACM's mission to become a supplier to major global semiconductor manufacturers,” said Dr. David Wang, President and Chief Executive Officer of ACM Research. “With our business scaled in mainland China and the evaluation at a major US manufacturer underway, we are beginning to see traction for our SAPS technology in the European market. The receipt of our first tool order in Europe is a testament to the strength of our technology and the efforts of our sales team. We are optimistic that success with this tool can lead to repeat business from this customer, as well as new opportunities with other major customers in the region.”

About SAPS Tool

ACM’s proprietary Space Alternated Phase Shift (SAPS) advanced wafer-cleaning technology employs alternating phases of megasonic waves in the gap between a megasonic transducer and the wafer. Unlike the stationary megasonic transducers used in previous generations of megasonic wafer-cleaning systems, SAPS technology moves or tilts the transducer while the wafer rotates, enabling megasonic energy to be delivered uniformly across all points on the wafer, even if the wafer is warped. SAPS is a faster process than conventional megasonic cleaning and does not experience material loss or create a rough wafer surface. SAPS achieves more thorough, comprehensive cleaning and has been demonstrated to 1xnm DRAM devices and beyond.

About ACM Research, Inc.

ACM develops, manufactures and sells semiconductor process equipment for single-wafer or batch wet cleaning, electroplating, stress-free polishing and thermal processes, which are critical to advanced semiconductor device manufacturing and wafer-level packaging. ACM is committed to delivering customized, high performance, cost-effective process solutions that semiconductor manufacturers can use in numerous manufacturing steps to improve productivity and product yield. For more information, visit www.acmrcsh.com.

Forward-Looking Statements

Information presented in this press release includes forward-looking statements for purposes of the safe harbor provisions of the Private Securities Litigation Reform Act of 1995. All statements contained in this press release that do not relate to matters of historical fact should be considered forward-looking statements, including statements in the first paragraph with respect to our full year 2022 revenue outlook and statements in the second paragraph with respect to projected 2023 revenue and the underlying expectations and assumptions of ACM management. Forward-looking statements are based on ACM management’s current expectations and beliefs, and involve a number of risks and uncertainties that are difficult to predict and that could cause actual results to differ materially from those stated or implied by the forward-looking statements. Those risks and uncertainties include, but are not limited to, the following, any of which could be exacerbated even further by the continuing COVID-19 outbreak in China and globally: anticipated customer orders or identified market opportunities may not grow or develop as anticipated; customer orders already received may be postponed or canceled; ACM may be unable to obtain the qualification and acceptance of its delivered tools when anticipated or at all, which would delay or preclude ACM’s recognition of revenue from the sale of those tools; suppliers may not be able to meet ACM’s demands on a timely basis; ACM’s technologies and tools may not gain market acceptance; ACM may be unable to compete effectively by, among other things, enhancing its existing tools, adding additional production capacity and engaging additional major customers; ACM may incur significant expenses long before it can recognize revenue from new products, if at all, due to the costs and length of research, development, manufacturing and customer evaluation process cycles; volatile global economic, market, industry and other conditions could result in sharply lower demand for products containing semiconductors and for ACM’s products and in disruption of capital and credit markets; ACM’s failure to successfully manage its operations, including its inability to hire, train, integrate and manage additional qualified engineers for research and development activities; and trade regulations, including those recently published by the U.S. Department of Commerce imposing certain restrictions on equipment shipments and business practices with China-based semiconductor manufacturers, currency fluctuations, political instability and war, all of which may materially and adversely affect ACM due to its substantial non-U.S. customer and supplier base and its substantial non-U.S. manufacturing operations. A further description of these risks, uncertainties and other matters can be found in filings ACM makes with the U.S. Securities and Exchange Commission. Because forward-looking statements involve risks and uncertainties, actual results and events may differ materially from results and events currently expected by ACM. ACM undertakes no obligation to publicly update these forward-looking statements to reflect events or circumstances that occur after the date hereof or to reflect any change in its expectations with regard to these forward-looking statements or the occurrence of unanticipated events.

© ACM Research, Inc. ULTRA C and the ACM Research logo are trademarks of ACM Research, Inc. For convenience, these trademarks appear in this press release without ™ symbols, but that practice does not mean that ACM will not assert, to the fullest extent under applicable law, its rights to such trademarks.

For investor and media inquiries, please contact:

In the United States:  The Blueshirt Group
   Yujia Zhai
   +1 (860) 214-0809
   yujia@blueshirtgroup.com
    
In China:    The Blueshirt Group Asia
    Gary Dvorchak, CFA
    gary@blueshirtgroup.com


FAQ

What is the significance of ACMR's first tool order in Europe?

ACMR's first tool order in Europe demonstrates the company's growing market presence and validation of its technology in the global semiconductor industry.

When is ACMR's Ultra C SAPS-V tool expected to ship?

The Ultra C SAPS-V tool is expected to be shipped to the European customer in the fourth quarter of 2023.

What technology does ACMR's SAPS cleaning tool utilize?

The SAPS cleaning tool employs Space Alternated Phase Shift (SAPS) technology, which utilizes alternating phases of megasonic waves for superior wafer cleaning.

Who is the customer for ACMR's first tool order in Europe?

The customer for ACMR's first tool order in Europe is a major global semiconductor manufacturer, though their identity is not disclosed.

How does ACMR's SAPS technology differ from traditional cleaning methods?

SAPS technology delivers uniform megasonic energy across all points of the wafer, reducing material loss and ensuring a smoother surface compared to previous methods.

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