Advanced Energy Expands High Accuracy Temperature Monitoring Portfolio with New Luxtron® FluorOptic® Sensing Platform
New sensing platform with RubiLux™ and VioLux™ phosphor formulations enable precise, repeatable measurement across an extended temperature range

Advanced Energy Expands High Accuracy Temperature Monitoring Portfolio with New Luxtron® FluorOptic® Sensing Platform (Photo: Business Wire)
Featuring a new light source and improved low noise photodetection, the Luxtron M-1000 provides dual channel capability with accuracy variations as low as ± 0.2°C, stability above 0.05°C and the industry’s broadest operating range from -200 to 450°C. The converter is optimized to work with both phosphor formulations to accommodate the full temperature range.
“Wafer temperature is a critical process parameter for advanced High Aspect Ratio (HAR) etching used to create semiconductor devices such as 3D NAND,” said
For decades, Advanced Energy’s Luxtron FOT sensing technology has been leading the industry with high temperature accuracy and wide operating range. The Luxtron FOT sensing system combines a phosphor-coated fiber optic probe with a high-performance converter that integrates an advanced light source, a photodetector proprietary software algorithm and low-noise amplification circuitry. Because measurement is based on optical sensing, Luxtron FOT systems offer more accuracy than conventional electrical sensors in processes involving strong electromagnetic fields, including plasma etch and deposition, MRI systems and power transformers.
For detailed product information and technical specifications, visit our website.
The Luxtron M-1000 will be showcased at AE’s booth 844 at SEMICON West 2022, which takes place July 12–14 at the Moscone Center in
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