SkyWater Announces Enhanced Capabilities with Multibeam’s First in Industry High Productivity Multicolumn E-Beam Lithography System
SkyWater Technology (NASDAQ: SKYT) has received a groundbreaking Multicolumn E-Beam Lithography (MEBL) system from Multibeam Corp. for volume production. This first-of-its-kind system offers high-throughput direct write patterning, significantly faster than conventional e-beam tools. The MEBL system enables new capabilities including secure chip ID, full wafer patterning for focal plane read-out ICs, and sub 50 nm geometries on 200 mm wafers.
The collaboration between SkyWater and Multibeam over the past two years has been important in defining system performance specifications. SkyWater CEO Thomas Sonderman highlighted the technology's value for customers in secure defense, biomedical, thermal imaging, high reliability, and advanced compute markets. The company plans to make the tool available for initial customer designs in Q4 2024.
SkyWater Technology (NASDAQ: SKYT) ha ricevuto un innovativo sistema di litografia a fasci elettronici multicolonna (MEBL) da Multibeam Corp. per la produzione in volume. Questo sistema, il primo del suo genere, offre una scrittura diretta ad alta produttività, significativamente più veloce degli strumenti e-beam convenzionali. Il sistema MEBL consente nuove capacità tra cui ID chip sicuri, patterning completo del wafer per circuiti integrati di lettura del piano focale e geometrie inferiori ai 50 nm su wafer da 200 mm.
La collaborazione tra SkyWater e Multibeam negli ultimi due anni è stata fondamentale per definire le specifiche di prestazione del sistema. Il CEO di SkyWater, Thomas Sonderman, ha evidenziato il valore della tecnologia per i clienti nei settori della difesa sicura, biomedicale, imaging termico, alta affidabilità e calcolo avanzato. L'azienda prevede di rendere disponibile lo strumento per i primi progetti dei clienti nel quarto trimestre del 2024.
SkyWater Technology (NASDAQ: SKYT) ha recibido un innovador sistema de litografía de haz electrónico multicolumna (MEBL) de Multibeam Corp. para producción en volumen. Este sistema, el primero de su tipo, ofrece un patronaje directo de alta capacidad, significativamente más rápido que las herramientas de haz electrónico convencionales. El sistema MEBL permite nuevas capacidades, incluyendo ID de chip seguro, patronaje completo del wafer para circuitos integrados de lectura del plano focal y geometrías por debajo de 50 nm en wafers de 200 mm.
La colaboración entre SkyWater y Multibeam durante los últimos dos años ha sido importante para definir las especificaciones de rendimiento del sistema. El CEO de SkyWater, Thomas Sonderman, destacó el valor de la tecnología para los clientes en defensa segura, biomédica, imagen térmica, alta fiabilidad y mercados de computación avanzada. La empresa planea hacer disponible la herramienta para los diseños iniciales de clientes en el cuarto trimestre de 2024.
SkyWater Technology (NASDAQ: SKYT)는 Multibeam Corp.로부터 대량 생산을 위한 혁신적인 다중 전자 빔 리소그래피(MEBL) 시스템을 받았습니다. 이 최초의 시스템은 기존 전자 빔 도구보다 상당히 빠른 고속 직접 쓰기 패터닝을 제공합니다. MEBL 시스템은 보안 칩 ID, 초점면 판독 IC를 위한 전체 웨이퍼 패터닝, 200mm 웨이퍼에서 50nm 이하의 기하학적 구조 등 새로운 기능을 가능하게 합니다.
지난 2년 동안 SkyWater와 Multibeam 간의 협업은 시스템 성능 사양을 정의하는 데 중요했습니다. SkyWater의 CEO인 Thomas Sonderman은 보안 방어, 생의학, 열화상, 높은 신뢰성, 고급 컴퓨팅 시장의 고객을 위한 기술의 가치를 강조했습니다. 이 회사는 2024년 4분기부터 초기 고객 디자인을 위해 도구를 제공할 계획입니다.
SkyWater Technology (NASDAQ: SKYT) a reçu un système de lithographie à faisceau électronique multicolonne (MEBL) révolutionnaire de Multibeam Corp. pour la production en volume. Ce système, le premier de son genre, offre un patronage direct à haut débit, significativement plus rapide que les outils à faisceau électronique conventionnels. Le système MEBL permet de nouvelles capacités, y compris l'ID de chip sécurisé, le patronage complet de wafers pour les circuits intégrés de lecture de plan focal et des géométries inférieures à 50 nm sur des wafers de 200 mm.
La collaboration entre SkyWater et Multibeam au cours des deux dernières années a été importante pour définir les spécifications de performance du système. Le PDG de SkyWater, Thomas Sonderman, a souligné la valeur de la technologie pour les clients dans les marchés de la défense sécurisée, biomédicale, d'imagerie thermique, de haute fiabilité et de calcul avancé. L'entreprise prévoit de rendre l'outil disponible pour les premiers projets des clients au quatrième trimestre 2024.
SkyWater Technology (NASDAQ: SKYT) hat von Multibeam Corp. ein bahnbrechendes Multicolumn E-Beam Lithography (MEBL) System für die Serienproduktion erhalten. Dieses erste seiner Art bietet hochgradiges Direct Write Patterning, das deutlich schneller ist als konventionelle E-Beam-Werkzeuge. Das MEBL-System ermöglicht neue Fähigkeiten, darunter sichere Chip-IDs, vollständiges Wafer-Patterning für Fokalplane-Leseschaltungen und Geometrien unter 50 nm auf 200-mm-Wafern.
Die Zusammenarbeit zwischen SkyWater und Multibeam in den vergangenen zwei Jahren war entscheidend für die Definition der Leistungsparameter des Systems. Der CEO von SkyWater, Thomas Sonderman, hob den Wert der Technologie für Kunden in sicheren Verteidigungs-, biomedizinischen, thermischen Bildgebungs-, Hochzuverlässigkeits- und fortschrittlichen Computer-Märkten hervor. Das Unternehmen plant, das Werkzeug im vierten Quartal 2024 für erste Kundenentwürfe verfügbar zu machen.
- Acquisition of advanced MEBL system enhancing SkyWater's lithography capabilities
- Enables new production capabilities including secure chip ID and sub 50 nm geometries on 200 mm wafers
- Positions SkyWater's Minnesota fab with the most advanced 200 mm lithography offering globally
- Expands capabilities and potential market reach in secure defense, biomedical, and advanced compute sectors
- None.
Insights
The introduction of Multibeam's Multicolumn E-Beam Lithography (MEBL) system at SkyWater's facility marks a significant leap in semiconductor manufacturing capabilities. This technology's ability to achieve sub-50 nm geometries on 200 mm wafers is particularly noteworthy, as it pushes the boundaries of what's possible in this wafer size.
The MEBL system's high-throughput direct write patterning, which is orders of magnitude faster than conventional e-beam tools, could potentially reduce production times and costs. This efficiency gain might translate to faster time-to-market for SkyWater's customers, especially in rapidly evolving sectors like advanced computing and biomedical devices.
Moreover, the system's versatility in handling various applications - from secure chip IDs to large format dies and high topology microfluidic architectures - positions SkyWater to cater to a diverse range of high-tech markets. This could potentially broaden their customer base and revenue streams.
However, it's important to consider the learning curve and potential initial inefficiencies as SkyWater integrates this new technology into their production processes. The true impact on productivity and profitability may take time to materialize fully.
While the financial implications of this technological advancement aren't explicitly stated, there are several potential impacts to consider. The investment in cutting-edge lithography technology could position SkyWater as a leader in the 200 mm wafer market, potentially attracting high-value customers and premium pricing for their advanced services.
The ability to offer maskless lithography could lead to cost savings in chip production, especially for low-volume, high-mix applications common in SkyWater's target markets like defense and biomedical. This could improve profit margins over time, though the initial capital expenditure for the MEBL system likely represents a significant investment.
Furthermore, the expanded capabilities might open up new market opportunities, particularly in areas requiring secure chip IDs or advanced photonics, potentially driving revenue growth. However, investors should be cautious about the time it may take to fully realize these benefits and the potential for increased operational costs during the integration phase.
It's also worth noting that while this technology positions SkyWater at the forefront of 200 mm wafer production, the broader industry trend is moving towards 300 mm wafers for high-volume applications. SkyWater's focus on niche, high-value markets with this technology could be a strategic differentiator, but it's important to monitor how this aligns with long-term industry trends.
Positions SkyWater’s
(Photo: Business Wire)
MEBL enables several new production capabilities for SkyWater’s customers including secure chip ID for anti-counterfeit applications and full wafer patterning to support focal plane read-out ICs and other types of large format die. MEBL also offers large depth of focus for a range of high topology microfluidic and MEMS architectures, curvilinear designs for photonics, and high-density MOS. In addition, it is the only production lithography tool capable of sub 50 nm geometries on 200 mm wafers.
Uniquely configured with multiple miniaturized electron beam columns, the MB platform elevates E-Beam Lithography (EBL) to a breakthrough maskless lithography production system with compelling performance and cost advantages for today’s IC fabs. The delivery of the first Multibeam system follows a close collaboration with SkyWater over the past two years. This partnership provided critical fab operational insights which were used to define key system performance specifications before delivery of the MB platform to SkyWater.
According to Multibeam Chairman and CEO, Dr. David K. Lam, “This is a significant milestone for Multibeam and we are immensely proud to share it with SkyWater. From the outset of our engagement with SkyWater they supported our mission to re-innovate EBL for high-volume production and provided critical user perspectives that helped us accelerate our development program and commercialize a world-class maskless lithography system. We are grateful for their collaboration and thrilled to place our first production tool in a SkyWater fab.”
SkyWater CEO and Director, Thomas Sonderman emphasized the value of this technology for customers across target growth markets, “We are excited to offer new lithography capabilities to our customers enabled by Multibeam’s revolutionary technology. The deployment of the MB platform will expand capabilities and time to market for innovators on the concept-to-production journey in secure defense, biomedical, thermal imaging, high reliability and advanced compute markets.”
Sonderman added: “Our engagement with Multibeam exemplifies the power of partnerships in developing breakthrough equipment to accelerate chip innovation in the
SkyWater will enable access to the tool for initial customer designs in 4Q24.
About Multibeam
Multibeam helps semiconductor leaders accelerate chip innovation with the industry’s first Multicolumn E-Beam Lithography (MEBL) system built for volume production. The technology enables applications like rapid prototyping, advanced packaging and heterogeneous integration, chip ID and traceability, high-mix quick-turn manufacturing, compound semiconductors, and more. Headquartered in Silicon Valley, the company is privately held and led by a team of semiconductor equipment and patterning technology experts. For more information, visit www.multibeamcorp.com.
About SkyWater Technology
SkyWater (NASDAQ: SKYT) is a
SkyWater Technology Forward-Looking Statements
This press release contains “forward-looking” statements within the meaning of the Private Securities Litigation Reform Act of 1995, including statements that are based on the Company’s current expectations or forecasts of future events, rather than past events and outcomes, and such statements are not guarantees of future performance. Forward-looking statements are subject to risks, uncertainties and assumptions, which may cause the Company’s actual results, performance or achievements to be materially different from those expressed or implied by such forward-looking statements. Key factors that could cause the Company’s actual results to be different than expected or anticipated include, but are not limited to, factors discussed in the “Risk Factors” section of its annual report on Form 10-K and quarterly reports on Form 10-Q, and in other documents that the Company files with the SEC, which are available at http://www.sec.gov. The Company assumes no obligation to update any forward-looking statements, which speak only as of the date of this press release.
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Multibeam Contact: Shani Williams | swilliams@multibeamcorp.com
SkyWater Company Contact: Tara Luther | +1 952-851-5023 | tara.luther@skywatertechnology.com
SkyWater Media Contact: Lauri Julian | +1 949-280-5602 | lauri.julian@skywatertechnology.com
Source: SkyWater Technology
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