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Cadence Digital and Custom/Analog Design Flows Achieve Certification for TSMC’s Latest N4P and N3E Processes

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Cadence Design Systems (CDNS) has announced certification of its digital and custom/analog design flows by TSMC for the N4P and N3E processes. This collaboration aims to enhance innovation in mobile, automotive, AI, and hyperscale computing. Customers are already utilizing these advances, achieving optimal power, performance, and area (PPA) goals while accelerating time-to-market. The enhanced capabilities include improved design methodologies and support for complex mixed-signal designs, enabled by tools like Virtuoso and Innovus.

Positive
  • Certification of Cadence's design flows for TSMC's advanced N4P and N3E technologies enhances product offerings.
  • Joint development allows customers faster access to advanced-node technologies, improving time to market.
  • Enhanced PDKs lead to optimal power and performance, supporting growth in high-demand sectors like mobile and AI.
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Highlights:

  • Companies collaborate to advance mobile, automotive, AI and hyperscale computing design innovation
  • Joint customers actively designing with enhanced PDKs based on the certified N4P and N3E flows
  • Cadence flows enhanced for N4P and N3E PDKs, providing engineers with easy analog migration, optimal PPA and faster time to market

SAN JOSE, Calif.--(BUSINESS WIRE)-- Cadence Design Systems, Inc. (Nasdaq: CDNS) today announced that TSMC has certified the Cadence® digital and custom/analog design flows for the latest TSMC N4P and N3E processes in support of the new Design Rule Manual (DRM) and FINFLEX technology. Through continued collaborations, the companies have also delivered the corresponding N4P and N3E process design kits (PDKs) to accelerate advanced-node mobile, AI and hyperscale computing design innovation. Customers have already started using the latest TSMC process technologies and certified Cadence flows to accomplish optimal power, performance and area (PPA) goals and speed time to market.

Latest N4P and N3E Digital Full-Flow Certification

The Cadence and TSMC R&D teams worked together closely to ensure the digital flow met TSMC’s advanced N4P and N3E certification requirements. Cadence’s complete RTL-to-GDS flow includes the InnovusImplementation System, QuantusExtraction Solution, Quantus FS solution, Tempus Timing Signoff Solution and ECO option, Pegasus Verification System, Liberate Characterization Solution, Voltus IC Power Integrity Solution and Voltus-Fi Custom Power Integrity Solution. The Cadence Genus Synthesis Solution and predictive iSpatial technology are also enabled for the TSMC N4P and N3E process technologies.

The digital full flow offers several key capabilities that support the TSMC N4P and N3E process technologies, including native mixed-height cell row optimization from synthesis to signoff engineering change orders (ECOs) for optimal PPA; standard-cell row-based placement; implementation results that are well-correlated to signoff for faster design closure; enhanced via pillar support for better design performance; large libraries containing many multi-height, voltage threshold (VT) and drive-strength cells; timing robustness cell characterization and analysis; reliability modeling using aging-aware STA; and CCSP model enhancements providing improved accuracy and simplified characterization for analysis via the Voltus IC Power Integrity Solution.

Latest N4P and N3E Custom/Analog Flow Certification

The Cadence Virtuoso® Design Platform—which includes the Virtuoso Schematic Editor, Virtuoso ADE Product Suite and Virtuoso Layout Suite—and the Spectre® Simulation Platform—which includes Spectre X Simulator, Spectre Accelerated Parallel Simulator (APS), Spectre eXtensive Partitioning Simulator (XPS) and the Spectre RF Option—have been certified for the TSMC N4P and N3E processes. The Virtuoso Design Platform uniquely provides a tight integration with the Innovus Implementation System, which augments the implementation methodology of mixed-signal designs via a common database.

The custom design reference flow (CDRF) has also been enhanced to support the latest N4P and N3E process technologies. The Virtuoso Schematic Editor, the Virtuoso ADE Suite and the integrated Spectre® X Simulator help customers effectively manage corner simulations, statistical analyses, design centering and circuit optimization. The Virtuoso Layout Suite has been tuned for efficient layout implementation, leveraging a row-based implementation methodology with placement, routing, fill and dummy insertion features; enhanced analog migration and layout reuse functionality; integrated parasitic extraction and EM-IR checks; and integrated physical verification capabilities.

“By continuing to work closely with Cadence, we’re ensuring that customers can use our most advanced N4P and N3E technologies and the certified Cadence digital and custom/analog flows with confidence,” said Dan Kochpatcharin, head of the Design Infrastructure Management Division at TSMC. “This joint effort combining TSMC’s technology advancements with Cadence’s leading design solutions helps our mutual customers meet the stringent power and performance requirements and quickly launch their next-generation silicon innovations to market.”

“Through our longstanding collaboration with TSMC, we’ve continued to keep our focus on creating new technologies that enable our mutual customers to achieve their PPA and productivity goals,” said Dr. Chin-Chi Teng, senior vice president and general manager in the Digital & Signoff Group at Cadence. “Our latest work with TSMC reaffirms our commitment to helping customers achieve design excellence with our flows and TSMC’s advanced technologies, and we’re always amazed by the innovations they create.”

The Cadence digital and custom/analog advanced-node solutions that have been tuned for TSMC’s N4P and N3E process technologies support the Cadence Intelligent System Design strategy, which enables customers to achieve system-on-chip (SoC) design excellence. To learn more about Cadence's advanced-node solutions, visit www.cadence.com/go/advndn4pn3e.

About Cadence

Cadence is a pivotal leader in electronic systems design, building upon more than 30 years of computational software expertise. The company applies its underlying Intelligent System Design strategy to deliver software, hardware and IP that turn design concepts into reality. Cadence customers are the world’s most innovative companies, delivering extraordinary electronic products from chips to boards to complete systems for the most dynamic market applications, including hyperscale computing, 5G communications, automotive, mobile, aerospace, consumer, industrial and healthcare. For eight years in a row, Fortune magazine has named Cadence one of the 100 Best Companies to Work For. Learn more at cadence.com.

© 2022 Cadence Design Systems, Inc. All rights reserved worldwide. Cadence, the Cadence logo and the other Cadence marks found at www.cadence.com/go/trademarks are trademarks or registered trademarks of Cadence Design Systems, Inc. All other trademarks are the property of their respective owners.

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Source: Cadence Design Systems, Inc.

FAQ

What recent certification did Cadence Design Systems achieve?

Cadence Design Systems recently achieved certification for its digital and custom/analog design flows by TSMC for the N4P and N3E processes.

How do Cadence's N4P and N3E certified flows impact customers?

The certified flows help customers achieve optimal power, performance, and area (PPA) goals, speeding up their time to market.

What industries benefit from Cadence's collaboration with TSMC?

The collaboration benefits industries such as mobile, automotive, AI, and hyperscale computing.

What tools are included in Cadence's enhanced design flows?

The enhanced design flows include tools like the Innovus Implementation System, Virtuoso Design Platform, and various verification and extraction solutions.

What is the significance of the partnership between Cadence and TSMC?

The partnership focuses on integrating advanced technologies, helping customers meet stringent power and performance requirements for next-generation silicon innovations.

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