Media Alert: Atomera to Deliver TechTALK on SSROI Substrates for Enhanced RF Performance at SEMICON West 2024
Atomera will present a TechTALK on their innovative Super-Steep Retrograde on Insulator (SSROI) substrates at SEMICON West 2024. The presentation, led by Hideki Takeuchi, VP of Engineering, will occur on July 9 from 2:40 to 2:50 p.m. PDT at the Moscone Center in San Francisco. The SSROI technology, epitaxially deposited onto ultra-thin RF-SOI wafers, aims to enhance RF switches and Low Noise Amplifier (LNA) devices, vital for 5G Advanced and 6G applications. Key improvements include reduced body resistance for better power handling in RF switches and decreased surface channel doping for improved cutoff frequency in LNA devices.
- Atomera's SSROI technology offers significant improvements in RF switch and LNA device performance, important for 5G and 6G applications.
- None.
Atomera Incorporated (Nasdaq: ATOM):
WHO: |
Hideki Takeuchi, Vice President of Engineering of Atomera Incorporated (Nasdaq: ATOM), a semiconductor materials and technology licensing company |
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WHAT: |
In-person presentation entitled “SSROI Substrates for RF Switch and LNA Device Performance Enhancement” |
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WHEN: |
Tuesday, July 9 from 2:40 p.m. to 2:50 p.m. PDT |
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WHERE: |
Moscone Center, TechTALKS Stage, Moscone South, Exhibition Level, Room 7, |
Atomera Incorporated will present a focused TechTALK on their innovative Super-Steep Retrograde on Insulator (SSROI) substrates, specifically designed to enhance the performance of RF switches and Low Noise Amplifier (LNA) devices. Atomera’s SSROI technology, epitaxially deposited onto ultra-thin RF-SOI wafers, promises significant improvements in critical RF switch characteristics essential for 5G Advanced and 6G applications. The new SSROI substrate reduces body resistance for power handling improvement of RF switch devices, in addition to reducing the surface channel doping and thus impurity scattering for cutoff frequency improvement of LNA devices.
The presentation is part of a broader session titled “Material Innovations for Advancing Design Optimization,” which focuses on the latest advancements in substrate technology for improved performance, power efficiency, area reduction, and cost-effectiveness in semiconductor devices.
Follow Atomera:
Company website: https://atomera.com/
Atomera whitepaper: https://atomera.com/news-and-blogs/
Atomera blog: https://atomera.com/news-and-blogs/
LinkedIn: www.linkedin.com/company/atomera/
About Atomera
Atomera Incorporated, one of America’s top 100 Best Small Companies in 2022 ranked by Forbes, is a semiconductor materials and technology licensing company focused on deploying its proprietary, silicon-proven technology into the semiconductor industry. Atomera has developed Mears Silicon Technology™ (MST®), which increases performance and power efficiency in semiconductor transistors. MST can be implemented using equipment already deployed in semiconductor manufacturing facilities and is complementary to other nano-scaling technologies in the semiconductor. More information can be found at www.atomera.com.
View source version on businesswire.com: https://www.businesswire.com/news/home/20240708124211/en/
Justin Gillespie
The Hoffman Agency
t: (925) 719-1097
jgillespie@hoffman.com
Source: Atomera Incorporated
FAQ
When and where will Atomera present their SSROI technology?
What is Atomera's SSROI technology designed to improve?
How does the SSROI substrate improve RF switch performance?
What benefit does the SSROI technology provide for LNA devices?